This study investigated the removal of 15 trace organic chemicals (TOrCs) occurring at ambient concentrations from municipal wastewater treatment plant effluent by advanced oxidation using UV/H2O2 at pilot-scale. Pseudo first-order rate constants (kobs) for photolytic as well as combined oxidative and photolytic degradation observed at pilot-scale were validated with results from a bench-scale collimated beam device. No significant difference was determined between pilot- and lab-scale performance. During continuous pilot-scale operation at constant UV fluence of 800 mJ/cm2 and H2O2 dosage of 10 mg/L, the removal of various TOrCs was investigated. The average observed removal for photo-susceptible (kUV>10−3 cm2/mJ; like diclofenac, iopromide and sulfamethoxazole), moderately photo-susceptible (10−4
Chair of Urban Water Systems Engineering, Technical University of Munich, Am Coulombwall 3, Garching, 85748, Germany; Department of Civil, Environmental, and Architectural Engineering, University of Colorado Boulder, UCB 607, Boulder, CO 80303, United States
Recommended Citation:
Miklos D.B.,Hartl R.,Michel P.,et al. UV/H2O2 process stability and pilot-scale validation for trace organic chemical removal from wastewater treatment plant effluents[J]. Water Research,2018-01-01,136